SILICON DIOXIDE PROCESS Russian patent published in 2009 - IPC C01B33/12 

Abstract RU 2357925 C1

FIELD: chemistry.

SUBSTANCE: invention can be used in chemical industry. Siliceous feed stock and ammonium fluoride - hydrodifluoride are mechanically mixed at room temperature until ammonia and water precipitation is stopped. Prepared charge mixture is heated up to temperature 320 - 340°C to separate gaseous ammonium hexaflourosilicate completely thereafter hydrolysed with ammonia water irrigation.

EFFECT: gas-phase process of carbon white silicone dioxide.

1 dwg, 2 ex

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RU 2 357 925 C1

Authors

D'Jachenko Aleksandr Nikolaevich

Krajdenko Roman Ivanovich

Dates

2009-06-10Published

2007-12-07Filed