METHOD OF PRODUCING NANOSIZED SILICON DIOXIDE Russian patent published in 2025 - IPC C01B33/12 B82B3/00 

FIELD: chemistry.

SUBSTANCE: invention relates to production of silicon dioxide in form of nanosized powder. Proposed method of producing silicon dioxide involves evaporation of a drop of molten silicon in a high-frequency electromagnetic field of a countercurrent inductor, in which it is in a state of levitation, entrainment of silicon vapours into the condensation zone is provided by a downward laminar flow of carrier gas, oxidation of silicon with oxygen in the reaction zone, and transfer of the formed silicon dioxide to the cooling region. Obtained powder is then collected on a filter. Continuity of obtaining nanosized powder of silicon dioxide is ensured by replenishment of evaporated drop by uniform supply of silicon rod into it at rate of 10–15 g/h. Finished product is silicon dioxide powder with average particle size in range of 12–24 nm. Inert gases are used as carrier gas, and oxygen is used as reagent gas.

EFFECT: disclosed method enables to control the particle size in the obtained nanosized silicon dioxide powder.

1 cl, 3 dwg