FLUID EJECTION HEAD AND MANUFACTURING METHOD OF SUBSTRATE FOR FLUID EJECTION HEAD Russian patent published in 2009 - IPC B41J2/16 

FIELD: printing.

SUBSTANCE: manufacturing method of head substrate for fluid ejection represents provision of silicon substrate containing on its surface layer of etching mask, which has opening, the formation of the first deepening in surface of the silicon substrate by means of anisotropic etching, the formation of the second deepening containing opening in the surface of the first deepening, thereby opening goes in the direction of the other surface of the silicon substrate, being inverse surface to the surface of a silicon substrate and the formation of the inlet channel by anisotropic etching of silicon substrate from surface having the second deepening. Fluid ejection head contains silicon substrate having element of energy generation on its surface that is configured with possibility to generate energy for liquid ejection and the inlet channel for liquid supply to the element of energy generation.

EFFECT: invention provides stable manufacturing of substrate for fluid ejection heads with form accuracy and high efficiency of technological process.

7 cl, 17 dwg