FIELD: printing industry.
SUBSTANCE: method to make a silicon substrate for a liquid-ejecting head, having the first surface, opposite to the second surface, includes the following stages: provision of a layer on the second surface of the silicon substrate, besides, this layer has a lower etching speed compared to silicon, when exposed to the silicon etchant; partial removal of the layer to open a part of the second surface of the silicon substrate, besides, this opened part surrounds at least one part of the layer; and moist etching of the specified layer and opened part of the second surface of the silicon substrate with application of the silicon etchant, in order to form a channel of liquid supply, stretching from the second surface to the first surface of the silicon substrate.
EFFECT: simplified formation of ink supply channel and reduced time of substrate making.
12 cl, 22 dwg
