FIELD: physics.
SUBSTANCE: invention relates to devices for precise sample positioning in ultrahigh vacuum using piezoelectric engines and a system of capacitive sensors in focused ion or electron beam installations in which nanoelements are formed. The sample is positioned relative an ion gun not using not only coarse ultrasonic engines but by moving an additional platform with piezoelectric engines into the sample positioning system whose position is tracked with precise capacitive sensors. There is compensation for thermal drift of the coordinate positioning system and nonlinearity of movement of the piezoelectric engines by processing signals from the capacitive sensors in the positioning system and feedback with the piezoelectric engines. There is tacking and compensation for deviation of the ion gun as a result of thermal warping of the vacuum chamber through additional movement of the piezoelectric engines as a result of processing signals from the capacitive sensors which keep track of the position of the flange on which the ion gun is mounted relative the base of the positioning system which is attached to the bottom flange of the chamber. The position of the positioning system in the ultrahigh vacuum chamber is monitored using an interferometric system outside the camber through viewing window.
EFFECT: increased accuracy of making the required theoretically calculated nanoelectronic elements with good reproducibility.
3 cl, 3 dwg, 1 ex
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Authors
Dates
2010-04-27—Published
2008-10-23—Filed