PROCEDURE FOR COATING SPUTTERING Russian patent published in 2011 - IPC C23C4/12 C23C4/04 

Abstract RU 2423545 C2

FIELD: metallurgy.

SUBSTANCE: procedure consists in sputtering layer of metal material at angle to substrate over 45° at first stage, in sputtering layer out of same metal material at angle less 45° at second stage and sputtering bio-active ceramic layer at angle 90° at third stage. Also, layers are sputtered at temperature 100-1000°C above temperature of sputtered material and at rate of sputtered particles 100-700 m/s.

EFFECT: increased size of pores, increased porosity and shear strength of coating.

3 ex

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RU 2 423 545 C2

Authors

Komlev Dmitrij Igorevich

Kalita Vasilij Ivanovich

Dates

2011-07-10Published

2009-07-13Filed