PROCEDURE FOR PRODUCTION OF HIGH PURITY COBALT FOR SPUTTERING TARGET Russian patent published in 2011 - IPC C22B23/02 C22B5/12 C22B9/22 

FIELD: metallurgy.

SUBSTANCE: procedure consists in reduction of cobalt chloride at heating till production of metal cobalt in form of powder or sponge. Upon reduction they are compressed into rod which is subjected to electron vacuum re-crystallisation to production of crystals of cobalt of high purity. Further, produced crystals are electron re-melted in a cooled crystalliser on each side at total depth not less, than two times for production of flat ingot of cobalt of high structure quality. Also, before reduction cobalt chloride is subjected to zone sublimation when flow of wet argon is transmitted at rate 100 ml/min opposite to transfer of sublimation zone of 50 mm width with length of of initial charge of cobalt chloride 500 mm and at rate of sublimation zone transfer 50 mm/hour with 10 passes at temperature 940-960°C. Upon zone sublimation, 90-95% of initial part of cobalt chloride ingot is separated and the separated part of the ingot of cobalt chloride is subjected to reduction at temperature 750-780°C during 1 hour.

EFFECT: raised processability at production of high purity cobalt designed for thin film metallisation with magnetron target sputtering.

1 ex