METHOD FOR OBTAINING HIGH-PURITY NICKEL FOR SPUTTERING TARGETS Russian patent published in 2012 - IPC C22B23/00 C22B9/16 C22B5/12 

FIELD: metallurgy.

SUBSTANCE: sublimation of nickel chloride powder and diffusion reduction of nickel chloride vapours is performed until compact reduced nickel is obtained. At that, sublimation of nickel chloride powder is performed in 10 passes of sublimation zone in wet argon flow at temperature of 930°C, and the obtained nickel chloride ingot is loaded to reactor and its sublimation is performed in the flow of dried argon and diffusion reduction of nickel chloride vapours is performed at temperature of 930°C in dried hydrogen flow. Then, vacuum floating-zone refining is performed until nickel monocrystals are obtained, and the required amount (as to weight) of nickel monocrystals is remolten in flat crystalliser in vacuum so that flat ingot with penetration through the whole depth of not less than two times on each side is obtained.

EFFECT: improving nickel purity for obtaining monocrystals and sputtering targets.

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