FIELD: metallurgy.
SUBSTANCE: procedure consists in cleaning chamber in medium of inert gas at item cleaning, in ion etching and ion plasma nitriding whereupon there is additionally performed ion etching of item surface. Ion-plasma nitriding with successive ion etching is performed in N stages, where N is integral number, and N≥1 till saturation with nitrogen of near-surface layer of metal of depth to 500 mcm. Further, there is applied coating by the method of physical sedimentation from vapour phase by application of a micro-layer of nano layers of thickness 1-100 nm of titanium, aluminium and silicon, application of a micro-layer of nano-layers of thickness 1-100 nm of nitrides of titanium, aluminium, and silicon or application of micro-layer in form of amorphous matrix of silicon nitride with solid inclusions of nitride of titanium and aluminium with typical distances between the said inclusions 1-100 nm.
EFFECT: coating with increased service life under conditions of erosion, corrosion and high temperature.
5 cl, 2 tbl, 2 ex
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Authors
Dates
2011-12-27—Published
2010-04-12—Filed