SUBSTRATE HOLDER AND INSTALLATION FOR APPLICATION OF COATING BY METHOD OF MAGNETRON SPUTTERING ON ITS BASE Russian patent published in 2011 - IPC C23C14/35 C23C14/56 

FIELD: machine building.

SUBSTANCE: substrate holder consists of at least one module containing at least one head with elements of substrates fixation connected with drive and set by means of carriers on base. Carriers are transferred into one of fixed positions of waiting or processing. Treated surfaces of substrates are arranged along normal to vector of sputtered material flow. A platform of the installation is made in form of a hollow circular cylinder which under automatic mode facilitates cyclic setting travels of the substrate holders by means of mechanisms of their drive from one position of processing to another at angle α=2π/n, where n is number of processing positions. The cases of the substrate holders with mechanisms of their transfer and time control sensors are arranged on a special stage inside the platform under an aperture. The stages have guides rigidly secured beneath plane of overlap along boundaries of apertures in the direction from periphery to centre of the platform and two stops. A stationary stop is mounted on an internal surrounding frame of the platform. A flap stop is mounted on the internal surrounding frame of the platform with a lock.

EFFECT: raised efficiency, flexibility, resource saving, serviceability and quality of settled layer.

10 cl, 9 dwg