METHOD OF PRODUCING HIGHLY PURE TRICHLOROSILANE Russian patent published in 2012 - IPC C01B33/107 B82B3/00 

FIELD: chemistry.

SUBSTANCE: method involves reaction of silicon tetrachloride with technical silicon and hydrogen chloride, followed by separation of the mixture of chlorosilanes and recycling unreacted silicon tetrachloride, where the trichlorosilane synthesis process is carried out in two steps: at the first step in a closed reactor, technical silicon with particle size 5-10 mm undergoes highly homogeneous active nano-grinding to particle size ranging from 1000 to 50 nm in the medium of highly pure silicon tetrachloride at temperature ranging from 260 K to 300 K until formation of gaseous silicon dichloride; at the second step, silicon dichloride reacts with hydrogen chloride in the reactor at temperature ranging from 160 K to 300 K to form highly pure trichlorosilane.

EFFECT: method is characterised by high efficiency, the possibility of fine adjustment of working processes, therefore influencing the amount and quality of the obtained product, low power consumption of the working processes, environmental friendliness of the working processes, and low metal consumption of the equipment which realises the novel technological process, while ensuring the given purity of the obtained trichlorosilane.

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