METHOD OF PRODUCING HIGH-PURITY NICKEL FOR SPUTTERED TARGETS Russian patent published in 2024 - IPC C22B23/00 C22B5/12 C22B9/16 

FIELD: metallurgy; powder metallurgy.

SUBSTANCE: invention can be used in production of sputtered targets for magnetron and electron-beam sputtering. Method involves production of nickel powder with carbon impurity content of up to 0.28 wt % and iron up to 0.01 wt %, which is subjected to vacuum decarbonisation by two-stage heat treatment in high vacuum. First step involves heating nickel powder to 650–750 °C with holding for 2 hours. Second stage consists in heating from the temperature of the first stage of thermal treatment to temperature of 1,350–1,400 °C with holding for 5 hours. Then the obtained nickel powder with nickel content of up to 99.99 wt % cools down together with the furnace to room temperature, after which it is removed from the furnace for storage in a container with a protective atmosphere of argon at an excess pressure of 0.5 atm., after which the targets are melted from the obtained nickel powder in a vacuum furnace.

EFFECT: obtaining high-purity nickel in form of ultrafine powder of high quality and with minimum content of impurities.

1 cl, 1 ex