ELEMENT PRODUCED BY WAY OF MICRO-TREATMENT, ITS MANUFACTURE METHOD AND ETCHING DEVICE Russian patent published in 2012 - IPC G02B1/11 G02B5/02 

FIELD: electricity.

SUBSTANCE: method for manufacture of the element produced by way of micro-treatment includes the following stages: generation of a resist layer on the stamping mould, exposure and development of the layer generated on the stamping mould for formation of a structure within the resist layer, placement of the stamping mould with a structure created in the resist layer onto an electrode and the stamp mould etching for an uneven shape formation on the stamping mould surface to obtain an element produced by way of micro-treatment. An uneven shape is formed on the electrode surface so that at the etching stage anisotropic etching is performed in a direction slanted relative to the stamping mould surface. The etching device contains a reservoir for the etching reaction and the first and the second electrodes positioned on opposite sides in the reservoir. The first electrode has an accommodation surface for accommodation of the substrate having an uneven surface shape so that anisotropic etching is performed in a direction slanted relative to the substrate surface.

EFFECT: provision for manufacture of an element having uneven structures slanted relative to the normal and the substrate surface at least in two different directions or having multiple areas wherein the structures slanting direction may be varied.

9 cl, 59 dwg