OPTIC MEASURING SYSTEM, AND MEASURING METHOD OF CRITICAL SIZE OF NANOSTRUCTURES ON FLAT SURFACE Russian patent published in 2013 - IPC G01B11/30 B82Y35/00 

FIELD: measurement equipment.

SUBSTANCE: optic measuring system includes the following: optic module of lighting and recording of an image, a control module of parameters of an optic schematic and lighting conditions; a calculation module of images of the inclined specimen surface; a comparison module of measured and calculated images of the inclined specimen surface. The method consists in the fact that a defocused image of the inclined nanostructured surface is recorded at the chosen fixed parameters of the optic schematic; images of the inclined nanostructured surface of the specimen are calculated at the value of the critical size, which is in the known specified boundaries; the measured image of the specimen surface is compared to calculated images and the best approximation of the value of critical size is determined.

EFFECT: providing the measurement of critical size of nanostructure based on processing of defocused images without any mechanical scanning of the investigated nanostructure along focus.

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