FIELD: measurement technology.
SUBSTANCE: invention relates to methods of measurement of nano-sized objects and more specifically to optical measuring system and corresponding method of measuring for determination of critical dimension (CD) for nano-sized objects. Optical measuring system based on optical microscope for measurement of CD has an optical module made with possibility to illuminate sample and recording defocused images nanostructured surface of sample, a module for controlling parameters of optical system, measurement module integrated optical transfer function (OTF); a module for calculating defocused images, CD estimation module nanostructure, which compares detected and calculated defocused images nanostructured surface and returning value CD nanostructure as a result of said comparison.
EFFECT: technical result consists in improvement of accuracy of determination of critical size by finding best conformity between registered and calculated defocused images considering OTF optical measuring system.
17 cl, 4 dwg
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