VACUUM PVD PLANT FOR APPLICATION OF COATINGS Russian patent published in 2013 - IPC C23C14/32 

FIELD: machine building.

SUBSTANCE: vacuum coating application plant includes inlet (12) of reactive gas, at least one PVD coating source (8, 21) with flat cathode (11) and substrate holder (6) containing several substrates (7); at that, substrate holder (6) has two-dimensional horizontal length and is located between at least two PVD coating sources. Several substrates (7) represent cutting tools with at least one cutting edge (E) in a peripheral end area of flat substrate (7), which are distributed in one plane of two- dimensional length of substrate holder (6). At that, substrate holder (6) is located in horizontal plane (3) in vacuum working chamber (1) and positioned at some distance between flat cathodes (11) of at least two above described PVD coating sources (8, 21) so that at least some part of at least one of the above described cutting edges (E) includes active cutting edge (E'), and it is oriented in relation to at least one of cathodes (11) of PVD coating sources (8, 21) always within the line-of-sight distance.

EFFECT: achieving high quality of the obtained coating.

35 cl, 10 dwg