DEVICE FOR DEPOSITION OF COATINGS ON SUBSTRATE BY CVD AND PVD METHODS Russian patent published in 2025 - IPC C23C28/00 B82B1/00 C23C14/00 C23C16/00 

FIELD: nanotechnology.

SUBSTANCE: invention relates to the field of nanotechnology and can be used for coating a substrate. The device for depositing coatings on a substrate by CVD and PVD methods contains a reactor and a substrate with a substrate holder. The reactor is made in the form of a cylinder with staggered viewing windows and contains a housing made with two holes for the input and output of reaction and inert gases, a housing lid, a reactor lid, an electrical circuit and measuring and auxiliary equipment. The specified viewing windows of the reactor are designed with the possibility of installing CVD and PVD equipment in them. Inside the reactor there is a mounting plate made with the possibility of attaching measuring and auxiliary equipment and a substrate holder to it. The reactor cover is made with an observation window, mounted on the reactor vessel cover through a seal and tightened with a clamp.

EFFECT: it is possible to form a coating on the substrate by CVD and PVD methods due to re-equipment of the reactor.

1 cl, 3 dwg