FIELD: electricity.
SUBSTANCE: in the system, a coating application unit is located inside a vacuum chamber. The coating application unit includes a vapour source providing the material applied on a substrate, a substrate holder holding the substrate to be coated, so that they are located in front of the vapour source, the cathode chamber unit and the remote anode. The cathode chamber unit includes a cathode, an optional primary anode and a screen that isolates cathode from the vacuum chamber. The specified screen has holes for passing the electron emission current from the cathode to the vacuum chamber. The vapour source is located between the cathode and the remote anode, and the remote anode is connected to the cathode. The system includes the primary power source connected between the cathode and the primary anode, and the secondary power source connected between the cathode chamber unit and the remote anode. The method includes generation of the primary arc in the electron-emitting cathode source between the cathode target and the primary anode, generation of the remote arc held in the coating application zone between the cathode chamber unit and the anode, connected to the cathode target, and generation of metal vapour flow from the source of the metal vapours toward at least one substrate, intended for coating.
EFFECT: resulting coatings have improved adhesion, smoothness, hyperfine microstructure, high density, low defect concentration and porosity and high functional characteristics.
36 cl, 29 dwg
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Authors
Dates
2018-01-09—Published
2013-09-13—Filed