NANOELECTROMECHANICAL SYSTEM FOR MEASUREMENT OF MOTION PARAMETERS AND METHOD OF ITS MANUFACTURING Russian patent published in 2014 - IPC G01P15/11 

FIELD: measurement equipment.

SUBSTANCE: system to measure motion parameters comprises the first solid-state base from a non-magnetic material, on which the sensitive element is fixed in the form of a cantilever beam made of active and passive parts separated from each other with a groove. On the free end of the active part there is a permanent magnet and the second base connected to it with a magnetoresistive element. At the same time the active part of the sensitive element is arranged outside the limits of the first base with arrangement of the groove along the rib of the first base. The second base is placed at the side of the active part of the sensitive element with arrangement of the surface of the magnetoresistive element in the plane stretching via the permanent magnet. Besides, the magnetic field of the magnet is perpendicular to the direction of the axis of light magnetisation of the magnetoresistive element. The method to manufacture a system for measurement of motion parameters consists in formation of the sensitive element by anisotropic liquid etching of the transverse groove in the single-crystal silicon, fixation on the free end of the active part of the sensitive element of the permanent magnet, fixation of the passive part of the sensitive element on the first base, fixation of the second base with the magnetoresistive element on it to the first base at the side of the active part of the sensitive element.

EFFECT: higher sensitivity of a measurement device.

6 cl, 2 dwg