DEVICE FOR CONTACT PHOTOLITHOGRAPHY FOR SEMICONDUCTOR PLATES WITH A BASE CUT Russian patent published in 2019 - IPC H01L21/31 

FIELD: photography.

SUBSTANCE: invention relates to devices intended for combination of patterns on a photomask and a semiconductor plate during its photolithographic processing and can be used in making photoconverters. Disclosed apparatus for contact photolithography for semiconductor plates with a base cut includes a matching table, a semiconductor wafer holder, photomask for front side of semiconductor plates, illumination source and microscopes with double monitor. At that, registration table and holder are made in the form of photomask for rear side of semiconductor plates, which is equipped with vacuum holes, sealing frame, mounting elements in form of disks and is located on carriage in form of support plate with built-in vacuum chambers. Photomask for front side of semiconductor plates is made with depressions for said discs, and the lighting source is made in the form of a metal box, in the cover and bottom of which there are two lamps with elliptical reflectors, between which there are elements for limiting light flux in the form of hollow cylinders with a light-absorbing inner surface. Besides, between the upper and the lower luminous flux restriction elements in the front wall of the box there is an opening for placement of the above carriage, and microscopes are made spatially fixed on the arched panel fixed on the table top.

EFFECT: higher efficiency due to reduced time for adjustment of optical device at combination and expansion of functional capabilities due to double-sided photolithography.

1 cl, 3 dwg