FIELD: physics, optics.
SUBSTANCE: invention relates to image sensors and imagers. In the image sensor the focusing pixel has a structure with the light screening layer for dividing a pupil. The screening layer is located between the microlens and the photo-electric conversion unit. The position of focus of the microlens is positioned farther on the microlens side, compared with the light screening layer. The distance from the provision of focus of a microlens to the light screening layer is greater than 0 and less than nFΔ, where n - index of refraction in the position of the microlens focus, F - the size of an aperture of a microlens and Δ - microlens diffraction limit.
EFFECT: ensuring of possibility of suppression of change in distribution of intensity of a pixel pupil for focusing caused by the position production tolerance for components.
4 cl, 22 dwg
