FIELD: physics, optics.
SUBSTANCE: invention relates to optoelectronics, particularly a method of making photosensitive materials and devices. A method of making a photosensitive silver-palladium resistive film includes forming, on the surface of a dielectric substrate, a layer of resistive paste consisting of silver oxide Ag2O, palladium, fine glass particles and organic binder. The formed layer is dried and burned in an air atmosphere at 605-700°C. A glass layer is then removed from the surface of the obtained film by evaporation with high-power pulsed laser radiation with a wavelength in the absorption region of the glass. Use of laser radiation with a wavelength corresponding to the absorption maximum of the glass is preferable.
EFFECT: wider spectral range of operation of the photosensitive silver-palladium resistive film.
2 cl, 3 dwg, 1 ex
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Authors
Dates
2015-08-10—Published
2013-10-18—Filed