FIELD: chemistry.
SUBSTANCE: method includes preliminary cleaning of a support by ion etching, applying an intermediate layer and subsequent magnetron sputtering from at least one platinum-based target in a vacuum in the plasma of a basic gas with addition of a reaction gas. Sputtering is carried out with power density on the sputtered magnetron target in the range of (0.004-0.17)*105 W/m2 with the ratio of concentration of the reaction and basic gases of 75-99%, with residual pressure of the reaction gas of 6.7-20 Pa, where the reaction gas used is oxygen. The invention also relates a catalyst obtained using said method.
EFFECT: method enables to obtain a catalytic electrode coating for electrochemical devices with high catalytic activity.
7 cl, 5 dwg, 1 tbl, 26 ex
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Authors
Dates
2015-09-10—Published
2014-05-30—Filed