FIELD: chemistry.
SUBSTANCE: invention relates to a method of producing transparent barrier multilayer system. Deposition is carried out in at least one vacuum chamber. On a transparent polymer film is deposited at least two transparent barrier layer and one located between both barrier layers of transparent intermediate layer. For deposition of barrier layers evaporated aluminium in presence of hollow cathode plasma and simultaneously in a vacuum chamber is at least one first reaction gas. As an intermediate layer is deposited silicon-containing layer by means of PECVD-process using plasma of hollow cathode.
EFFECT: obtaining a transparent barrier multilayer system with high sealing effect, as well as with high rate of application.
7 cl, 1 tbl, 1 ex
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