METHOD OF PRODUCING SILICON DIOXIDE NANOPOWDER Russian patent published in 2016 - IPC C01B33/18 B82B3/00 

Abstract RU 2588208 C1

FIELD: technological processes.

SUBSTANCE: invention relates to plasma technology of producing silicon dioxide. Raw material for producing silicon dioxide nanopowder is silicate material with silicon dioxide concentration not less than 70 % and particle size of not more than 2 mm. Raw material is introduced into plasma reactor sideways. Plasma temperature is provided equal to 2,500-3,000 °C. Nanopowder is produced via deposition of fine particles on walls of plasma reactor, which is subjected to forced water cooling.

EFFECT: method increases output of high-quality nanopowders at low power consumption.

1 cl, 1 tbl

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RU 2 588 208 C1

Authors

Vlasov Viktor Alekseevich

Kosmachev Pavel Vladimirovich

Skripnikova Nelli Karpovna

Volokitin Gennadij Georgievich

Volokitin Oleg Gennadevich

Bezukhov Konstantin Aleksandrovich

Dates

2016-06-27Published

2015-04-23Filed