FIELD: technological processes.
SUBSTANCE: invention relates to plasma technology of producing silicon dioxide. Raw material for producing silicon dioxide nanopowder is silicate material with silicon dioxide concentration not less than 70 % and particle size of not more than 2 mm. Raw material is introduced into plasma reactor sideways. Plasma temperature is provided equal to 2,500-3,000 °C. Nanopowder is produced via deposition of fine particles on walls of plasma reactor, which is subjected to forced water cooling.
EFFECT: method increases output of high-quality nanopowders at low power consumption.
1 cl, 1 tbl
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Authors
Dates
2016-06-27—Published
2015-04-23—Filed