METHOD FOR PRODUCING NANO-SIZED SILICON DIOXIDE POWDER AND PLASMA INSTALLATION FOR ITS IMPLEMENTATION Russian patent published in 2023 - IPC H05H1/42 C01B33/18 B82Y40/00 

FIELD: plasma technologies.

SUBSTANCE: invention relates to the plasma technologies providing plasma exposure to materials and can be used to produce silicon dioxide nanopowders. The method for producing nanosized silicon dioxide powder is to place a briquette containing from 70% quartz sand and up to 30% carbon on a pusher and feed it into the reactor; water is supplied into the water-cooled cover and water-cooled body, then a flow of compressed electric arc plasma is initiated using a plasma torch, which is directed to the briquette, under the influence of a high temperature of 2000-5000°C the components of the briquette enter into a chemical reaction with the formation of silicon monoxide and carbon monoxide; water steam is supplied through the fitting to the pipe located on the water-cooled lid. Getting into the nozzle and mixing with water vapour, silicon monoxide is oxidized to silicon dioxide and quickly cools, forming a mixture of particles with a size of 10-200 nm, which are then agglomerated into a mixture of particles with a size of 0.1-100 mcm, which then follow to the trap. As the briquette in the reactor evaporates, it is replaced with the next briquette moved by a pusher. A plasma installation is also claimed for implementing a method for producing nanosized silicon dioxide powder.

EFFECT: simplification of the process, increasing the specific surface area of silicon dioxide powder.

2 cl, 3 dwg