FIELD: metallurgy.
SUBSTANCE: precursor solution of nano-compound contains one or more sol-gel precursors of metal and/or sol-gel precursors of semimetal, polar proton solvent in the form of organic acid, and polar aprotic solvent in amount from approximately 1 to 25 vol%. Proposed precursor solution makes gel after applying shear force. Also disclosed is method of producing solid thin film layer on substrate, involving use of precursor solution, and thin film produced by this method.
EFFECT: proposed is precursor solution of nano-compounds used to produce solid thin film on substrate.
30 cl, 2 tbl, 2 ex, 1 dwg
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