DEVICE AND METHOD FOR PRODUCING HIGH-TEMPERATURE PLASMA AND EUV RADIATION Russian patent published in 2016 - IPC H05G2/00 

FIELD: electronics.

SUBSTANCE: invention relates to plasma engineering. High-voltage and grounded assemblies are made with removable axisymmetrical high-voltage and grounded electrodes, which outside discharge zone are separated by slot clearance connected with working chamber via channels made in grounded assembly. Detachable electrodes are equipped with channel for flow of liquid coolant and liquid coolant feed and discharge ports. Power supply comprises pulse charged capacitors, connected to high-voltage and grounded electrode via single-coil saturated throttle, circular core of which is arranged outside detachable high-voltage and grounded electrodes. Improvement of method consists in that pinch type discharge is ignited between detachable high-voltage and grounded electrodes, performing cooling thereof and vacuum pumping of gas from slot-type gap between them, and after 5·10⁷ or more pulses replacing detachable electrodes.

EFFECT: technical result is broader functional capabilities of source of high-temperature plasma and EUV radiation due to possibility of its operation in long-term mode at high brightness, power and efficiency.

13 cl, 1 dwg