PHOTODEFINED APERTURE PLATE AND ITS MANUFACTURING METHOD Russian patent published in 2016 - IPC C25D5/02 C25D5/10 

Abstract RU 2593254 C2

FIELD: electroplating.

SUBSTANCE: present invention relates to electroplating and can be used for making fluid nebulizers with controlled size of droplets. In one embodiment, a method for manufacturing an aperture plate includes depositing a releasable seed layer above a substrate, applying a first patterned photolithography mask above the releasable seed layer, the first patterned photolithography mask having a negative pattern to a desired aperture pattern, electroplating a first material above the exposed portions of the releasable seed layer and defined by the first mask, applying a second photolithography mask above the first material, the second photolithography mask having a negative pattern to a first cavity, electroplating a second material above the exposed portions of the first material and defined by the second mask, removing both masks, and etching the releasable seed layer to release the first material and the second material. First and second material form an aperture plate for use in aerosolizing a liquid.

EFFECT: technical result: higher stability and reliability of making aperture plates with adjustable openings.

17 cl, 1 tbl, 8 dwg

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RU 2 593 254 C2

Authors

Xu Hong

Dates

2016-08-10Published

2011-12-23Filed