DEVICE FOR PREPARATION OF GAS MIXTURE Russian patent published in 2016 - IPC B01F3/02 

FIELD: chemistry.

SUBSTANCE: invention relates to gas mixers and can be used for preparing a mixture of gases in various technological processes, for example, for producing a mixture of gases, used as plasma forming medium in process of plasma sputtering. Device for preparation of gas mixture used in ion-plasma sputtering, comprises a mixing chamber connected with plasma cell device, gas feed inlet valves installed at inlet into mixing chamber, exhaust valve for feeding gas mixture, installed at the outlet of mixing chamber, pressure sensors installed in mixing chamber and in plasma cell, control unit, wherein all valves are connected with control unit and pressure sensors to allow automatic switching of valves.

EFFECT: invention provides discrete portion supply of gases of required type and required pressure in a mixing chamber, which enables to obtain a mixture of gases with a certain proportion of required components, generation of required dosed gas flow of obtained mixture into working chamber (plasma cell), maintaining required pressure of mixture of gases in volume of mixing chamber and in working chamber (plasma cell), to control parameters of mixture and gas flow in manual, semiautomatic or automatic modes.

1 cl, 5 dwg