FIELD: medicine.
SUBSTANCE: invention refers to dental orthopaedics and traumatology and can be used for making endosseous implants on a titanium base. Method involves preliminary preparation of the implant surface base made of titanium, including mechanical processing of the titanium base (shaping), mechanical polishing, then cleaning the surface and chemical degreasing, further treatment of the titanium base surface with helium ions beam in order to implant helium ions into the titanium base and form a porous structure on the implant surface; herewith helium ions are implanted with the energy of 100-200 keV and the dose of 6·1017-6·1018 ion/cm2; then the formed porous structure is treated in vacuum medium of carbon dioxide (CO2) with a beam of argon inert gas ions in order to implant argon ions into the formed porous structure of titanium while forming a carbon diamond-like nonporous film; herewith argon ions are implanted with the energy of 40-130 keV and the exposure dose of 1.25·1016-3.1·1016 ion/cm2, which enables to obtain endosseous dental implants with higher values of microhardness, fatigue strength and osseointegration.
EFFECT: invention relates to a method for making endosseous dental implants.
1 cl, 2 tbl, 7 dwg
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Authors
Dates
2016-09-20—Published
2015-05-05—Filed