METHOD OF PRODUCING ENDOHEDRAL NANOSTRUCTURES BASED ON IMPLANTED IONS CHANNELING Russian patent published in 2017 - IPC B82B3/00 C01B31/02 B82Y40/00 

FIELD: nanotechnology.

SUBSTANCE: method of producing endohedral nanostructures involves introduction of accelerated ions, for example metal ions, in polyhedral nanostructures, for example, fullerene molecules. Relative position of polyhedral nanostructure and oncoming implanted ion is fixed with nanochannels of track membrane, which is implanting, in which collision takes place. Nanochannels have doubly conical shape with internal narrowing to impede transition of molecules of polyhedral nanostructure from one side of membrane to the other, focusing of moving ion to center of nanochannel and releasing of polyhedral nanostructural molecule from it after ion implantation. Part doubly conical shape nanochannel and track membrane surface between nanochannels are made conducting from the side of supply of molecules of polyhedral nanostructures to provide accelerating and focusing potential, applied to molecules of polyhedral nanostructure in nanochannel. Second track membrane is used to form ion flow structure, which is membrane of ion source, made in single process with the first one, and repeating structure of nanochannels’ location on first implanting membrane. Controlled DC voltage is supplied between above track membranes. Volumes of reactor with flows of transmitted polyhedral nanostructures, ions, as well as obtained endohedral nanostructures, are separated with implanting membrane and kept in these temperatures providing supply and required aggregate state of materials, involved in process of implantation, as well as removal of products from implantation area. When producing endohedral structures in solution, polar solvent is used, in which molecules of polyhedral nanostructures obtain negative charge, and implanted ions obtain positive charge.

EFFECT: output of endohedral nanostructures is increased.

1 cl, 4 dwg