FIELD: chemistry.
SUBSTANCE: method for titanium silicides production involves mixing of titanium and silicon gaseous halides, taken at a molar ratio of 5:3 to 1:2 at a temperature of 450 to 1100°C in an inert gas atmosphere at normal pressure, titanium silicides synthesis by reduction of the titanium and silicon halides mixture in an inert gas atmosphere at normal pressure with molten zinc at a temperature of 450 to 900°C or zinc vapor at a temperature of 900 to 1100°C, titanium silicides purification by zinc halides and zinc metal distilling in an inert gas atmosphere at a temperature of 900 to 1100°C under normal pressure or in a vacuum at a temperature of 700 to 900°C.
EFFECT: provision of a simple, economical and safe method for titanium silicides production while expanding the range of feedstock by using chlorides, bromides and iodides of titanium and silicon.
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