DEVICE FOR GENERATING HIGH-FREQUENCY DISCHARGE PLASMA Russian patent published in 2017 - IPC H05H1/30 

Abstract RU 2633707 C2

FIELD: physics.

SUBSTANCE: device for generating a high-frequency discharge comprises a cathode and an anode installed through a discharge gap. The anode is electrically connected to the feeder of a high-voltage high-frequency generator. The cathode is made in the form of an additional electrode connected electrically to one of the capacitors of a variable capacitor. The other lining of this capacitor is electrically isolated from both the ground bus and the common wire of the high-voltage RF generator.

EFFECT: possibility of forming a nonequilibrium plasma of high-frequency discharges, the electron temperature of which is comparable to the electron temperature of the flare discharge plasma, and the gas temperature is comparable with the gas temperature of the arc discharge plasma.

3 dwg

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RU 2 633 707 C2

Authors

Myshkin Vyacheslav Fedorovich

Ushakov Ivan Alekseevich

Khan Valerij Alekseevich

Bespala Evgenij Vladimirovich

Pavlyuk Aleksandr Olegovich

Dates

2017-10-17Published

2016-04-07Filed