FIELD: separation; mixing.
SUBSTANCE: invention relates to gas treatment device comprising chamber divided into several channels (A, B, C, D, E, F), each of which has input (e) and output (s) of gas. Wherein, in each channel (A-F), there is at least one lamp generating photon radiation (PH), in particular ultraviolet radiation, wherein, each channel (A-F) being bounded by two baffles, each of which contains: dielectric wall, photocatalyst element, located opposite dielectric wall on the side of the channel (A-F) and containing a substrate on which the photocatalyst is located, first electrode disposed opposite photocatalytic cell, and second electrode disposed opposite the dielectric wall. Invention also relates to method for assembling device, a gas processing system and a gas processing method.
EFFECT: proposed invention combines the effect of ultraviolet radiation on a photocatalyst and a cold surface plasma.
10 cl, 5 dwg
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