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(19)

RU

(11)

2 572 895

(13)

C2

(51)

IPC

B01D53/32(2006-01-01)

A61L2/14(2006-01-01)

A61L9/22(2006-01-01)

H05H1/46(2006-01-01)

H01J25/50(2006-01-01)

(21) (22)

Application

2013114464/05, 2011-09-01

(24)

Start date

2011-09-01

(22)

Actual filing date

2011-09-01

(45)

Published

2016-01-20

(72)

Inventor

Boduehn Zhan-Mishel'

(73)

Holder

Boduehn Zhan-Mishel'

DEVICE AND METHOD FOR PROCESSING OF GASEOUS MEDIUM AND APPLICATION OF SAID DEVICE FOR PROCESSING OF GASEOUS MEDIUM, SOLID BODY, SURFACE OF THEIR WHATEVER COMBINATION Russian patent published in 2016 - IPC B01D53/32 A61L2/14 A61L9/22 H05H1/46 H01J25/50 

Abstract RU 2572895 C2

FIELD: process engineering.

SUBSTANCE: invention relates to device intended for plasma processing of gaseous medium. Claimed device comprises the generator of plasma in gaseous medium and dielectric structure composed of the tube of fused quartz. Note here that plasma can be transferred into dielectric structure and interaction chamber including the inner space and the wall.

EFFECT: efficient processing of gaseous medium, lower power input.

27 cl, 9 dwg

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RU 2 572 895 C2

Authors

Boduehn Zhan-Mishel'

Dates

2016-01-20—Published

2011-09-01—Filed

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