METHOD OF CONTROLLING AN ION IMPLANTER IN PLASMA IMMERSION MODE Russian patent published in 2018 - IPC H01J37/32 

FIELD: electricity.

SUBSTANCE: invention relates to a method for controlling an ion implanter having a plasma power (AP) and a substrate power supply (PS) the substrate supply comprises: an electric generator (HT), whose positive pole is connected to ground; the first switch (SW1) whose first pole is connected to the negative pole of said generator (HT), and whose second pole is connected to the output terminal (S) of substrate power supply; and a second switch (SW2), whose first pole is connected to said output connector (S), and whose second pole is connected to a neutralization connector (N). Method comprises implantation phase (A-D) and the neutralization phase (E-H). Method further includes a relaxation stage (C-F), when the plasma power supply (AP) is inactivated. In addition, the neutralization step includes a preliminary step (E-F) for closing the second switch (SW2), said preliminary step being followed by a cancelling step (F-G) to activate said plasma power (AP).

EFFECT: technical result is the facilitation of neutralization of positive charges and stabilization of implantation parameters.

7 cl, 4 dwg