METHOD OF MANUFACTURING A PHOTONIC WAVEGUIDE AND A PHOTONIC WAVEGUIDE MANUFACTURED IN SUCH METHOD Russian patent published in 2018 - IPC G02B6/30 

Abstract RU 2663090 C1

FIELD: physics.

SUBSTANCE: group of inventions disclosing a photonic waveguide and a method for manufacturing a photonic waveguide are claimed. Method comprises the steps of: forming an optical waveguide on a first surface (S1) of a dielectric substrate; thinning the dielectric substrate to form a photonic waveguide; characterized in that the thinning is performed by cutting out a second surface (S2) of the dielectric substrate opposite to the first surface (S1), wherein the thinning comprises a recess whose profile extends parallel to the optical waveguide, the depth of the recess changes continuously and gradually between the first zero-depth point P1 at the height of the second surface (S2) and the maximum depth (e) at a predetermined distance (Iq) from the first end of the photonic waveguide, wherein the first end is for attaching an optical fiber, the change in the depth of the recess forms a vertical transition zone of the optical mode of length (Iq) between the photonic waveguide and the optical fiber.

EFFECT: reduction of losses between a photonic waveguide and a standard single-mode optical fiber, and also an increase in the resistance of photonic waveguides to temperature.

15 cl, 11 dwg

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RU 2 663 090 C1

Authors

Guyot, Clement

Fizaine, Etienne

Henrot, Fabien

Courjal, Nadege

Dates

2018-08-01Published

2015-12-18Filed