FIELD: electricity.
SUBSTANCE: invention relates to the plate centering system, which has plate with holder, in which the plate is centered in the holder, both at room temperature, and at higher temperatures, regardless of the plate and the holder thermal expansion, and the plate can expand freely in the holder at higher temperatures. In particular, the invention relates to the target having the target frame mount, which is very well suited for use in the coating source for the target coating with large-power pulsed magnetron sputtering.
EFFECT: technical result is the target destruction prevention under the hydrostatic pressure effect in the cooling pipeline.
6 cl, 6 dwg
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