METHOD OF DETERMINING CONTENT OF HIGHLY DISPERSED SILICON DIOXIDE IN QUARTZ GLASS BASED SLURRY Russian patent published in 2019 - IPC G01N15/02 

FIELD: chemistry.

SUBSTANCE: invention relates to methods of analytical monitoring and can be used to determine quantitative content of highly dispersed silica in a quartz glass based slurry. Method of determining content of highly dispersed silicon dioxide in a quartz glass based slurry involves extraction of 1–100 g of a slip fraction containing silicon dioxide particles (SiO₂) with size from 0 to 400 nm, drying the collected sample in a crucible at temperature of 70–200 °C for 0.5–8 hours to constant weight and weighing obtained dry residue, wherein prior to sampling initial slurry based on quartz glass is centrifuged with rotor rpm of 2,000–15,000 rpm for 15–40 minutes and separating upper liquid phase containing SiO₂ particles with size from 0 to 400 nm, from solid residue.

EFFECT: technical result is controlling content of high-dispersed particles of silicon dioxide in a slurry, controlling properties of ceramic articles based on silicon dioxide, low power consumption.

1 cl, 2 tbl