FIELD: manufacturing technology.
SUBSTANCE: invention relates to methods of making high-frequency crystal elements of piezoelectric devices. Performing mechanical treatment, chemical cleaning and liquid chemical polishing. Operation of chemical polishing of crystalline plates and/or crystalline elements is carried out in a static mode at normal temperature and with etching rate of not more than 0.008 mcm/min at the stage of removal of the disturbed layer.
EFFECT: simplification of manufacturing process and reduction of spread along thickness.
1 cl
| Title | Year | Author | Number |
|---|---|---|---|
| PROCESS OF MANUFACTURE OF QUARTZ CRYSTALLINE ELEMENTS | 1989 |
|
RU1739826C |
| AT-CUR CRYSTAL ELEMENT MANUFACTURING PROCESS | 1995 |
|
RU2117382C1 |
| CRYSTAL RESONATOR MANUFACTURING PROCESS | 1999 |
|
RU2169986C2 |
| METHOD TO MANUFACTURE QUARTZ CRYSTALLINE ELEMENTS OF Z-SECTION | 2012 |
|
RU2475950C1 |
| METHOD OF PRODUCING LANTHANUM-GALLIUM SILICATE CRYSTALLINE ELEMENTS OF Y-CUT | 2009 |
|
RU2430824C2 |
| METHOD FOR PRODUCING QUARTZ CRYSTAL PARTS OF INVERTED MESA-STRUCTURE | 2005 |
|
RU2287218C2 |
| HIGH-FREQUENCY FILTER AT CUT CRYSTAL RESONATOR | 2008 |
|
RU2377718C1 |
| PIEZOELECTRIC CAVITY | 1992 |
|
RU2047267C1 |
| METHOD AND DEVICE FOR MANUFACTURING CRYSTAL ELEMENTS | 2005 |
|
RU2296417C2 |
| MANUFACTURING METHOD OF QUARTZ SENSITIVE ELEMENTS OF SENSORS | 2019 |
|
RU2722539C1 |
