FIELD: radio engineering, communication.
SUBSTANCE: in the method to manufacture crystalline elements (CE) of a Z-section includes mechanical and chemical cleaning of a quartz plate, application of protective metallised layers ontp a quartz plate, group formation of topology of protective metallised layers by the method of photolithography, formation of a volume microstructure of the specified relief by etching, removal of protective layers by etching and production of an electrode system, at the same time in the proposed method the quartz plate is exposed to ultrasonic action and serial treatment in solutions of alkaline, acid reagents with washing in distilled water and drying in alcohol vapours, afterwards it is coated with a double-sided thin-film layer of Cr-Au, using photolithography, topology of a protective mask is formed, the second protective layer is applied from copper, chemical-dynamic and plasma-chemical etching is carried out, protective metallised layers are removed, repeatedly the thin-film coating of Cr-Au is applied onto the quartz plate, and using the photolithography method, topology of the electrode system is generated, as well as of contact sites with subsequent separation of the quartz plate into separate elements.
EFFECT: improved accuracy of generation of a volume microstructure and quality of quartz element surface.
3 cl, 3 ex, 7 dwg
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Authors
Dates
2013-02-20—Published
2012-01-30—Filed