APPARATUS FOR PRODUCING A WIDE-APERTURE LOW-ENERGY ION FLUX Russian patent published in 2020 - IPC H01J27/06 H01J37/301 

FIELD: technological processes.

SUBSTANCE: invention relates to the field of plasma equipment. Device for producing a wide-aperture low-energy ion stream comprises a main gas-discharge gap for forming a band-shaped electron beam, consisting of an elongated slit cathode, a mesh anode, dielectric insert from fluoroplastic and system of formation of "plasma sheet" behind mesh anode consisting of accelerating electrode-extractor, collector and dielectric substrate, near surface of which flow of low-energy ions is created. Above the substrate surface a beam-plasma discharge is formed in the form of a "plasma sheet" as a wide-aperture emitter of the ion stream with energy of ions on the order of average energy of secondary plasma electrons in the "plasma sheet". Control of energy of ion flow is carried out by changing average energy of secondary plasma electrons in "plasma sheet" due to change of gas pressure and amplitude of voltage pulses on main discharge gap.

EFFECT: possibility of forming a wide-aperture low-energy ion flux with energy of 0_6–1 eV for use in precision plasma technologies.

1 cl, 5 dwg