FIELD: measurement technology.
SUBSTANCE: invention relates to a method of controlling and analyzing deposits in an industrial water supply system. Disclosed method of analyzing deposition on a substrate in contact with industrial water in an industrial water supply system includes heating substrate at a time, when substrate is in contact with industrial water in industrial water supply system, to temperature higher than industrial water temperature thereby forming deposition on substrate; creation of a series of digital images of a substrate when the substrate is in contact with industrial water in an industrial water supply system; detecting a deposition element on each of a series of digital images of the substrate; and analyzing the deposition element on each of the series of digital images of the substrate to determine the nature of the change in formation of deposition on the substrate in an industrial water supply system.
EFFECT: technical result is higher efficiency of monitoring industrial water supply systems in order to minimize or prevent deposits (mineral or any other) on heat exchange surfaces as part of an operation plan for operation and/or treatment of industrial water supply systems.
20 cl, 7 dwg, 1 tbl
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