STAMP FOR IMPRINT LITHOGRAPHY AND METHOD OF ITS PRODUCTION AND USE Russian patent published in 2021 - IPC G03F7/00 

FIELD: imprint lithography.

SUBSTANCE: invention relates to a stamp for an imprint lithography method, to methods for such stamp production and to imprinting methods using a stamp, or to the use of such a stamp in an imprinting method. A stamp (14) for the imprint lithography method is described. The stamp contains the body of the elastomeric stamp with the fluid-permeable organic polymeric volumetric part (110), the surface with a formed pattern (16) of topological features of the relief for imprinting an imprinting composition (12) in fluid communication with an organic polymer volumetric part permeable to fluids, and at least one basic organic group capable of stimulating the curing of the imprinting composition when it is in contact with the patterned surface, dispersed in the internal volume of the fluid-permeable organic polymeric bulk portion.

EFFECT: reducing of imprinting compositions cost, and increasing the stamp service life, giving the pattern topological features of high quality imprinting composition.

31 cl, 2 tbl, 4 dwg