DEVICE AND METHOD FOR CLEANING PART OF THE SUBSTRATE AREA Russian patent published in 2021 - IPC G03F1/82 

FIELD: cleaning devices.

SUBSTANCE: invention relates to an apparatus and method for cleaning part of the area of ​​a substrate, in particular of a photomask. The device comprises a cleaning head having a bottom surface configured to be placed over and in close proximity to the substrate area to be cleaned, the bottom surface having a central opening formed therein, a first annular groove surrounding the central opening, and at least a second groove, located between the first annular groove and the central hole, the first annular groove in fluid communication with the first hole providing connection to the external supply source, and the second annular groove in fluid communication with the second hole providing connection to the external supply source, the tape feeding mechanism positioned with the possibility of supplying the abrasive belt to the central hole in the lower surface of the cleaning head, so that part of the abrasive belt protrudes from the central hole, and a liquid conduit having an outlet for supplying liquid to the back of the abrasive belt in or near the center hole. According to the method, a projecting portion of an abrasive belt that protrudes from a central opening of a cleaning head is positioned in contact with a portion of a substrate to be cleaned, with the lower surface of the cleaning head being positioned in close proximity to a portion of a substrate to be cleaned. Liquid is supplied to the back of the abrasive belt at or near the center hole of the cleaning head so that at least a portion of the abrasive belt protruding from the center hole is wetted and relative movement of the abrasive belt and the portion of the substrate surface to be cleaned is provided.

EFFECT: ensured possibility of cleaning local areas of the photomask without resorting to applying chemicals to areas that do not require cleaning.

27 cl, 9 dwg