FIELD: nano-imprint lithography.
SUBSTANCE: nano-imprinted substrates are often used in the manufacture of miniaturized devices for electrical, optical and biochemical applications. Technologies for forming such imprints, for example, nano-imprinted lithography, can leave material residues on the surface of substrates, which affects the bonding technology and reduces the quality of finished devices. Nano-imprinted substrate is proposed with area free of material residues or areas with reduced residues to improve bond quality. Methods for manufacturing nano-imprinted substrates without residues of material after the completion of the process of forming an imprint are also proposed. These methods include physical removal methods, selective etching methods, and energy-applied methods.
EFFECT: said invention is aimed at obtaining areas free of material residues on the surface of the substrate, which can be used to obtain compounds with higher strength.
19 cl, 15 dwg
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