FIELD: technological processes.
SUBSTANCE: method of production of regular systems of nano-size silicon whiskers includes preparation of silicon plate by masking of its surface with photoresist, making holes in it, electrochemical deposition of metal islets into photoresist holes from electrolyte solution, and installation of prepared plate into growth furnace with further growing of silicon whiskers on it, at that cylindrical openings in photoresist are created with diameter of less than 250 nm by means of imprint-lithography, metal islets are deposited with thickness of less than 12.5 nm, after that photoresist is removed in 5% solution of hydrofluoric acid.
EFFECT: method makes it possible to considerably facilitate creation of nano-technological instruments on nano-crystals.
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