SOURCE OF PULSE ELECTRONIC BEAMS Russian patent published in 2021 - IPC H01J37/65 H01J3/02 

FIELD: electronics.

SUBSTANCE: source of a pulsed electron beam is a discharge device and can be used to modify the surface properties of materials. The multipoint cathode of the electron beam source is made in the form of a cathode substrate with current stabilizing resistors fixed on the substrate with tips that pass through the holes in the mask. The source also contains a discharge electrode, a focusing electrode, a stabilizing grid, a control grid, an anode electrode, and a target. The discharge electrode is made in the form of a system of identical conductors equidistant from each other. On the one hand, the conductors are connected to the collector bus, and on the other, to the electrons extracting elements. Resistors with spikes are placed along the conductors at the same distance from each other in circles centered on the axes of the conductors. The electrons pulling elements are located above the resistors in the same plane, perpendicular to the conductors.

EFFECT: increasing the homogeneity of the electron beam on the target surface.

5 cl, 2 dwg