PLASMA-IMMERSION ION TREATMENT AND DEPOSITION OF COATINGS FROM VAPOUR PHASE WITH HELP OF LOW-PRESSURE ARC DISCHARGE Russian patent published in 2019 - IPC C23C14/24 C23C14/35 C23C14/54 H01J37/32 H05H1/00 

FIELD: chemistry.

SUBSTANCE: invention relates to a system for plasma sputtering of coatings (embodiments) and a device for plasma sputtering of coatings (embodiments). System comprises cathode of magnetron with long edge and short edge. Magnetic pole magnetron provides creation of electromagnetic barrier. At least one remote arc discharge is ignited separately from the magnetron cathode and in the immediate vicinity of the cathode so that it is held within the volume of the vicinity of the target of the magnetron. Remote arc discharge extends parallel to the long edge of the magnetron target and is limited by the target surface on one side and the electromagnetic barrier from all other sides. Protective casing of the remote arc discharge cathode and the protective casing of the anode pass over the arc discharge and across the short edge of the magnetron cathode. Outside the plasma generating assembly there is a magnetic system which generates magnetic field lines passing into the plasma and holding the plasma before the substrate.

EFFECT: technical result consists in production of high quality coating film due to provision of high-energy particles generation during coating application.

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